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Micro-Nano Contamination Control Expert
Micro-Nano Contamination Control Expert
12-inch Wet Bench Cleaning
12-inch Wet Bench Cleaning

High capacity, with a transfer rate of 600 wafers/hour from load to unload.

Standardized independent modules enables simplified design, assembly, and maintenance.

Breakage detection system in tank identifies broken wafers, preventing secondary damage.

Key Applications

RCA

PR Strip

Gate Clean

Oxide Etch

Nitride Etch

Wafer Recycle

CoSix Selectivity Etch

NiPtSi Selectivity Etch

BEOL Post Etch Polymer Removal

Technical Features

High stability

Max WPH~400

Modular design

Optimized transfer system