Rear-top integrated backside transfer mechanism minimizes footprint.
Standard Marangoni drying; optimized drying program boosts output.
Optimized tank flow design enhances cleaning efficiency and uniformity.
RCA
PR Strip
Gate Clean
Solvent Clean
Wafer Recycle
Al Etch
Oxide Etch
Nitride Etch
CoSix Selectivity Etch
High stability
Max WPH~400
Modular design
Optimized transfer system
Tel
Global